CMP Wafer Clean PVA Brush Customized

 nodular PVA brush Description: Various cleaning and processing steps are required during semiconductor wafer manufacturing,Nodular roller is used for semiconductor field, hard disk, wafer industrial for the surface cleaning and treatment such as remove the dust,residule and chemical on the wafer surface to ensure the surface smooth and cleanliness, besides this, it also used for wafer water absorb and moisturize. It have unique shape which is customized by your requirement to suit for your machine.PVA Brush roller also has the feature of high cleanness without dust drop out, it's most people's best prefer.    Physical characteristics of PVA Brush roller 30% compressive stress 110-120 g/cm2 Apparent Density     0.11-0.13 g/cm3 Tensile Strength     4.7-5.6 kgf/cm2 Elongation at Break 320% Tearing Strength 2.3 ~ 2.6 kgf/cm Porosity 90 ~ 92% AVG pore size 100 ~ 130um     Chemistry solvent or detergent effects   Chemistry solvent or detergent Effec…